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Ion Implantation of UO~2

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Title: Ion Implantation of UO~2
Society for the Advancement of Material and Process Engineering; Affordable materials technology platform to global value and performance
Authors: Meek, T. T., Haire, M. J., Tesmer, J., Wetteland, C., Hanrahan, R.
Source: INTERNATIONAL SAMPE SYMPOSIUM AND EXHIBITION. 2:1703-1710
Availability: http://explore.bl.uk/primo_library/libweb/action/display.do?tabs=detailsTab&gathStatTab=true&ct=display&fn=search&doc=ETOCCN044071423&indx=1&recIds=ETOCCN044071423
Database: British Library Document Supply Centre Inside Serials & Conference Proceedings
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DbLabel: British Library Document Supply Centre Inside Serials & Conference Proceedings
An: CN044071423
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PubType: Conference
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  Data: Ion Implantation of UO~2<br />Society for the Advancement of Material and Process Engineering; Affordable materials technology platform to global value and performance
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  Data: <i>INTERNATIONAL SAMPE SYMPOSIUM AND EXHIBITION</i>. 2:1703-1710
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RecordInfo BibRecord:
  BibEntity:
    Languages:
      – Text: English
    PhysicalDescription:
      Pagination:
        PageCount: 8
        StartPage: 1703
    Titles:
      – TitleFull: Ion Implantation of UO~2
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          Name:
            NameFull: Meek, T. T.
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          Name:
            NameFull: Haire, M. J.
      – PersonEntity:
          Name:
            NameFull: Tesmer, J.
      – PersonEntity:
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            NameFull: Wetteland, C.
      – PersonEntity:
          Name:
            NameFull: Hanrahan, R.
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          Dates:
            – D: 01
              M: 01
              Type: published
              Y: 2002
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              Value: 9780938994909
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              Value: 0938994905
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            – Type: volume
              Value: 2
          Titles:
            – TitleFull: INTERNATIONAL SAMPE SYMPOSIUM AND EXHIBITION
              Type: main
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