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Phase mask pinholes as spatial filters for laser interference lithography

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Title: Phase mask pinholes as spatial filters for laser interference lithography
Authors: Capraro, Giovanna, Lipkin, Maxim, Möller, Michael, Bolten, Jens, Lemme, Max C.
Source: Advanced Photonics Research, 4, 2300225, 2023
Publication Year: 2022
Collection: Physics (Other)
Subject Terms: Physics - Optics, Physics - Applied Physics
More Details: Laser resonators have outputs with Gaussian spatial beam profiles. In laser interference lithography (LIL), using such Gaussian shaped beams leads to an inhomogeneous exposure of the substrate. As a result, dimensions of lithography defined features vary significantly across the substrate. In most LIL setups, pinholes are used as filters to remove optical noise. Following a concept proposed by Hariharan et. al. a phase mask can be added to these pinholes. In theory, this modification results in a more uniform beam profile, and, if applied as spatial filters in LIL, in improved exposure and hence feature size uniformity. Here, we report on the first successful fabrication of such elements and demonstrate their use in an LIL setup to reduce feature dimension variations from 47.2% to 27.5% using standard and modified pinholes, respectively.
Document Type: Working Paper
DOI: 10.1002/adpr.202300225
Access URL: http://arxiv.org/abs/2211.09985
Accession Number: edsarx.2211.09985
Database: arXiv
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  Data: Phase mask pinholes as spatial filters for laser interference lithography
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  Data: <searchLink fieldCode="AR" term="%22Capraro%2C+Giovanna%22">Capraro, Giovanna</searchLink><br /><searchLink fieldCode="AR" term="%22Lipkin%2C+Maxim%22">Lipkin, Maxim</searchLink><br /><searchLink fieldCode="AR" term="%22Möller%2C+Michael%22">Möller, Michael</searchLink><br /><searchLink fieldCode="AR" term="%22Bolten%2C+Jens%22">Bolten, Jens</searchLink><br /><searchLink fieldCode="AR" term="%22Lemme%2C+Max+C%2E%22">Lemme, Max C.</searchLink>
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  Data: Advanced Photonics Research, 4, 2300225, 2023
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  Data: Laser resonators have outputs with Gaussian spatial beam profiles. In laser interference lithography (LIL), using such Gaussian shaped beams leads to an inhomogeneous exposure of the substrate. As a result, dimensions of lithography defined features vary significantly across the substrate. In most LIL setups, pinholes are used as filters to remove optical noise. Following a concept proposed by Hariharan et. al. a phase mask can be added to these pinholes. In theory, this modification results in a more uniform beam profile, and, if applied as spatial filters in LIL, in improved exposure and hence feature size uniformity. Here, we report on the first successful fabrication of such elements and demonstrate their use in an LIL setup to reduce feature dimension variations from 47.2% to 27.5% using standard and modified pinholes, respectively.
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      – TitleFull: Phase mask pinholes as spatial filters for laser interference lithography
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            NameFull: Capraro, Giovanna
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            NameFull: Lipkin, Maxim
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            NameFull: Lemme, Max C.
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