Effective Optimization Strategy for Electron Beam Lithography of Molecular Glass Negative Photoresist

Authors: Jiaxing Gao, Siliang Zhang, Xuewen Cui, Xue Cong, Xudong Guo, Rui Hu, Shuangqing Wang, Jinping Chen, Yi Li, Guoqiang Yang

Source: Advanced Materials Interfaces, Vol 10, Iss 20, Pp n/a-n/a (2023)

Subject Terms: electron beam lithography, molecular glass negative photoresists, photoacid generators, photodegradable nucleophiles, Physics, QC1-999, Technology

File Description: electronic resource

Relation: https://doaj.org/toc/2196-7350

Access URL: https://doaj.org/article/d2d1ae8dc0e64c1fba2863baddb479d8