Unbiased roughness measurements for 0.55NA EUV material setup
Metrology, Inspection, and Process Control XXXVII

Authors: Mathew, Bobin, Arad, Shahar, Brand, Omri, Frank, Tal, Alkoken, Ran, Shilo, Yael, Melamed, Yarden, Yosef, Rotem Mor, Suh, Hyo Seon, Heo, Seonggil

Source: Proceedings of SPIE, the International Society for Optical Engineering. 12496:1249607-1249607-8

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Steer by Image Technology for Intelligent Reflecting Surface Based on Reconfigurable Metasurface with Photodiodes as Tunable Elements.

Authors: Rotshild, David¹, drotshild@gmail.comrozbandaniel@ariel.ac.il, Rozban, Daniel¹, Rahamim, Efi¹, Barom, Asaf¹, Yosef, Rotem¹, Bhanam, Liel¹, Abramovich, Amir¹

Source: Crystals (2073-4352); Jul2022, Vol. 12 Issue 7, pN.PAG-N.PAG, 14p

In Situ Detoxification of Venomous Agent X Surrogate Profenofos by Doped Titanium Dioxide Nanoparticles under Illumination at the UV and Visible Ranges.

Authors: Dayan, Avraham, Mor Yosef, Rotem, Risphon, Judith, Tuval, Eran, Fleminger, Gideon

Source: Journal of Physical Chemistry A; 11/7/2019, Vol. 123 Issue 44, p9456-9461, 6p

Unbiased roughness measurements for 0.55NA EUV material setup

Authors: Robinson, John C., Sendelbach, Matthew J., Mathew, Bobin, Arad, Shahar, Brand, Omri, Frank, Tal, Alkoken, Ran, Shilo, Yael, Melamed, Yarden, Yosef, Rotem Mor, Suh, Hyo Seon, Heo, Seonggil, Halder, Sandip

Source: Proceedings of SPIE; April 2023, Vol. 12496 Issue: 1 p1249607-1249607-8

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