Fluid handling structure, a lithographic apparatus and a device manufacturing method

Lithographic apparatus, support table for a lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

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Defectivity process optimization on immersion topcoat less resist stacks.

Authors: Shigemori, Kazuhito, Wang, Suping, Tedeschi, Len, Tanriseven, Gazi, Maas, Raymond, Verspaget, Coen, Marechal, Ruud, Lammers, Ad, Mallmann, Joerg, Harumoto, Masahiko, Hisai, Akihiro, Asai, Masaya

Source: Proceedings of SPIE; Nov2009 Part 2, Issue 1, p72732B-72732B-13, 13p

Sensitivity enhancement of chemically amplified resists and performance study using EUV interference lithography

Authors: Panning, Eric M., Goldberg, Kenneth A., Buitrago, Elizabeth, Nagahara, Seiji, Yildirim, Oktay, Nakagawa, Hisashi, Tagawa, Seiichi, Meeuwissen, Marieke, Nagai, Tomoki, Naruoka, Takehiko, Verspaget, Coen, Hoefnagels, Rik, Rispens, Gijsbert, Shiraishi, Gosuke, Terashita, Yuichi, Minekawa, Yukie, Yoshihara, Kosuke, Oshima, Akihiro, Vockenhuber, Michaela, Ekinci, Yasin

Source: Proceedings of SPIE; March 2016, Vol. 9776 Issue: 1 p97760Z-97760Z-15, 9678256p

Evaluation of EUV resist performance below 20nm CD using helium ion lithography

Authors: Wood, Obert R., Panning, Eric M., Maas, Diederik, van Veldhoven, Emile, van Langen–Suurling, Anja, Alkemade, Paul F.A., Wuister, Sander, Hoefnagels, Rik, Verspaget, Coen, Meessen, Jeroen, Fliervoet, Timon

Source: Proceedings of SPIE; April 2014, Vol. 9048 Issue: 1 p90482Z-90482Z-9, 814348p

Novel high sensitivity EUV photoresist for sub-7nm node

Authors: Hohle, Christoph K., Younkin, Todd R., Nagai, Tomoki, Nakagawa, Hisashi, Naruoka, Takehiko, Tagawa, Seiichi, Oshima, Akihiro, Nagahara, Seiji, Shiraishi, Gosuke, Yoshihara, Kosuke, Terashita, Yuichi, Minekawa, Yukie, Buitrago, Elizabeth, Ekinci, Yasin, Yildirim, Oktay, Meeuwissen, Marieke, Hoefnagels, Rik, Rispens, Gijsbert, Verspaget, Coen, Maas, Raymond

Source: Proceedings of SPIE; March 2016, Vol. 9779 Issue: 1 p977908-977908-7

Challenge toward breakage of RLS trade-off for EUV lithography by Photosensitized Chemically Amplified Resist (PSCAR) with flood exposure

Authors: Panning, Eric M., Goldberg, Kenneth A., Nagahara, Seiji, Carcasi, Michael, Nakagawa, Hisashi, Buitrago, Elizabeth, Yildirim, Oktay, Shiraishi, Gosuke, Terashita, Yuichi, Minekawa, Yukie, Yoshihara, Kosuke, Tomono, Masaru, Mizoguchi, Hironori, Estrella, Joel, Nagai, Tomoki, Naruoka, Takehiko, Dei, Satoshi, Hori, Masafumi, Oshima, Akihiro, Vockenhuber, Michaela, Ekinci, Yasin, Meeuwissen, Marieke, Verspaget, Coen, Hoefnagels, Rik, Rispens, Gijsbert, Maas, Raymond, Nakashima, Hideo, Tagawa, Seiichi

Source: Proceedings of SPIE; March 2016, Vol. 9776 Issue: 1 p977607-977607-18