DDR process and materials for NTD photo resist toward 1Xnm patterning and beyond

Authors: Shigaki, Shuhei, Shibayama, Wataru, Nakajima, Makoto, Sakamoto, Rikimaru

Source: 2017 China Semiconductor Technology International Conference (CSTIC) Semiconductor Technology International Conference (CSTIC), 2017 China. :1-4 Mar, 2017

Relation: 2017 China Semiconductor Technology International Conference (CSTIC)

Dry Development Rinse Process (DDRP) and material (DDRM) for novel pattern collapse free process

Authors: Sakamoto, Rikimaru, Shibayama, Wataru, Shigaki, Shuhei, Nakajima, Makoto

Source: 2016 China Semiconductor Technology International Conference (CSTIC) Semiconductor Technology International Conference (CSTIC), 2016 China. :1-4 Mar, 2016

Relation: 2016 China Semiconductor Technology International Conference (CSTIC)

NNMT activation can contribute to the development of fatty liver disease by modulating the NAD+ metabolism

Authors: Komatsu, Motoaki, Kanda, Takeshi, Urai, Hidenori, Kurokochi, Arata, Kitahama, Rina, Shigaki, Shuhei, Ono, Takashi, Yukioka, Hideo, Hasegawa, Kazuhiro, Tokuyama, Hirobumi, Kawabe, Hiroshi, Wakino, Shu, Itoh, Hiroshi

Source: Scientific reports. 8(1):1-15

Availability: http://explore.bl.uk/primo_library/libweb/action/display.do?tabs=detailsTab&gathStatTab=true&ct=display&fn=search&doc=ETOCvdc_100153487689.0x000001&indx=1&recIds=ETOCvdc_100153487689.0x000001

Discovery of a benzimidazole series as the first highly potent and selective ACSL1 inhibitors

Authors: Hayashi, Kyohei, Kondo, Noriyasu, Omori, Naoki, Yoshimoto, Ryo, Hato, Megumi, Shigaki, Shuhei, Nagasawa, Ayumi, Ito, Mana, Okuno, Takayuki

Source: Bioorganic & medicinal chemistry letters. 33

Availability: http://explore.bl.uk/primo_library/libweb/action/display.do?tabs=detailsTab&gathStatTab=true&ct=display&fn=search&doc=ETOCvdc_100134193309.0x000001&indx=1&recIds=ETOCvdc_100134193309.0x000001

Possible roles of long-chain sphingomyelines and sphingomyelin synthase 2 in mouse macrophage inflammatory response

Authors: Sakamoto, Hideaki, Yoshida, Tetsuya, Sanaki, Takao, Shigaki, Shuhei, Morita, Hirotoshi, Oyama, Miki, Mitsui, Masaru, Tanaka, Yoshikazu, Nakano, Toru, Mitsutake, Susumu, Igarashi, Yasuyuki, Takemoto, Hiroshi

Source: Biochemical and biophysical research communications. 482(2):202-207

Availability: http://explore.bl.uk/primo_library/libweb/action/display.do?tabs=detailsTab&gathStatTab=true&ct=display&fn=search&doc=ETOCvdc_100050833582.0x000001&indx=1&recIds=ETOCvdc_100050833582.0x000001

Dry Development Rinse Process (DDRP) & Materials (DDRM) For EUVL

Authors: Shibayama, Wataru, Shigaki, Shuhei, Nakajima, Makoto, Takeda, Satoshi, Onishi, Ryuji, Sakamoto, Rikimaru

Source: Journal of photopolymer science and technology. 29(3):469-474

Availability: http://explore.bl.uk/primo_library/libweb/action/display.do?tabs=detailsTab&gathStatTab=true&ct=display&fn=search&doc=ETOCRN607175637&indx=1&recIds=ETOCRN607175637

New Approach for ArFi Extension by Dry Development Rinse Process

Authors: Shibayama, Wataru, Shigaki, Shuhei, Takeda, Satoshi, Onishi, Ryuji, Nakajima, Makoto, Sakamoto, Rikimaru

Source: Journal of photopolymer science and technology. 29(1):69-74

Availability: http://explore.bl.uk/primo_library/libweb/action/display.do?tabs=detailsTab&gathStatTab=true&ct=display&fn=search&doc=ETOCRN607174931&indx=1&recIds=ETOCRN607174931

Thin film forming composition for lithography containing titanium and silicon

Synthesis of new CO 2-soluble ruthenium(II) and cobalt(II) polypyridine complexes bearing fluorinated alkyl chains and their application to photoreduction of liq. CO 2

Authors: Hirose, Takuji, Shigaki, Shuhei, Hirose, Makoto, Fushimi, Atsushi

Source: In Journal of Fluorine Chemistry 2010 131(9):915-921

New functional surface treatment process and primers for high-NA EUV lithography

Authors: Guerrero, Douglas, Amblard, Gilles R., Shibayama, Wataru, Shigaki, Shuhei, Takeda, Satoshi, Kato, Kodai, Nakajima, Makoto, Sakamoto, Rikimaru

Source: Proceedings of SPIE; May 2023, Vol. 12498 Issue: 1 p124980O-124980O-10, 12373031p

Mass-Tag Technology Responding to Intracellular Signals as a Novel Assay System for the Diagnosis of Tumor

Authors: Kang, Jeong-Hun, Katayama, Yoshiki, Han, Aishan, Shigaki, Shuhei, Oishi, Jun, Kawamura, Kenji, Toita, Riki, Han, Xiao Ming, Mori, Takeshi, Niidome, Takuro

Source: In Journal of the American Society for Mass Spectrometry 2007 18(1):106-112

Enhancement of sensitivity and resolution by functional surface treatment process and primers (FSTP)

Authors: Guerrero, Douglas, Amblard, Gilles R., Shibayama, Wataru, Shigaki, Shuhei, Takeda, Satoshi, Kato, Kodai, Furukawa, Yuki, Saijo, Taiki, Nakajima, Makoto, Sakamoto, Rikimaru

Source: Proceedings of SPIE; April 2024, Vol. 12957 Issue: 1 p1295716-1295716-10

New functional surface treatment process and primers for high-NA EUV lithography.

Authors: Shibayama, Wataru, Shigaki, Shuhei, Takeda, Satoshi, Kato, Kodai, Nakajima, Makoto, Sakamoto, Rikimaru

Source: Proceedings of SPIE; 4/11/2023, Vol. 12498, p124980O-124980O-10, 1p

DDR process and materials for novel tone reverse technique

Authors: Goldberg, Kenneth A., Felix, Nelson M., Shigaki, Shuhei, Shibayama, Wataru, Takeda, Satoshi, Tamura, Mamoru, Nakajima, Makoto, Sakamoto, Rikimaru

Source: Proceedings of SPIE; March 2018, Vol. 10583 Issue: 1 p105830M-105830M-7, 952478p

DDR process and materials for NTD photo resist in EUV lithography

Authors: Gargini, Paolo A., Naulleau, Patrick P., Ronse, Kurt G., Itani, Toshiro, Shigaki, Shuhei, Takeda, Satoshi, Shibayama, Wataru, Nakajima, Makoto, Sakamoto, Rikimaru

Source: Proceedings of SPIE; October 2017, Vol. 10450 Issue: 1 p104500N-104500N-12, 10345513p

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Single-nm resolution approach by applying DDRP and DDRM

Authors: Panning, Eric M., Goldberg, Kenneth A., Shibayama, Wataru, Shigaki, Shuhei, Takeda, Satoshi, Nakajima, Makoto, Sakamoto, Rikimaru

Source: Proceedings of SPIE; April 2017, Vol. 10143 Issue: 1 p101431H-101431H-10, 10041680p

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Novel ArF extension technique by applying Dry Development Rinse Process (DDRP) and Materials (DDRM)

Authors: Hohle, Christoph K., Younkin, Todd R., Shibayama, Wataru, Shigaki, Shuhei, Takeda, Satoshi, Onishi, Ryuji, Nakajima, Makoto, Sakamoto, Rikimaru

Source: Proceedings of SPIE; March 2016, Vol. 9779 Issue: 1 p97791A-97791A-11, 9681321p

Novel DDR process and materials for front-edge NTD process

Authors: Hohle, Christoph K., Younkin, Todd R., Shigaki, Shuhei, Takeda, Satoshi, Shibayama, Wataru, Onishi, Ryuji, Nakajima, Makoto, Sakamoto, Rikimaru

Source: Proceedings of SPIE; March 2016, Vol. 9779 Issue: 1 p97790P-97790P-7, 880118p