Characterization of half-pitch 15-nm metal wire circuit fabricated by directed self-assembly of polystyrene-block-poly(methyl methacrylate)

Authors: Kasahara, Yusuke, Seino, Yuriko, Sato, Hironobu, Kanai, Hideki, Kobayashi, Katsutoshi, Kubota, Hitoshi, Miyagi, Ken, Minegishi, Shinya, Kodera, Katsuyoshi, Kihara, Naoko, Nomura, Satoshi, Tobana, Toshikatsu, Shiraishi, Masayuki, Kawamonzen, Yoshiaki, Azuma, Tsukasa

Source: In Microelectronic Engineering 15 June 2016 159:21-26

A novel simple sub-15 nm line-and-space patterning process flow using directed self-assembly technology

Authors: Seino, Yuriko, Kasahara, Yusuke, Sato, Hironobu, Kobayashi, Katsutoshi, Miyagi, Ken, Minegishi, Shinya, Kodera, Katsuyoshi, Kanai, Hideki, Tobana, Toshikatsu, Kihara, Naoko, Fujiwara, Tomoharu, Hirayanagi, Noriyuki, Kawamonzen, Yoshiaki, Azuma, Tsukasa

Source: In Microelectronic Engineering 20 February 2015 134:27-32

The Photopolymer Science and Technology Award

Authors: Takano, Hiroki, Wang, Lei, Tanaka, Yuki, Maeda, Rina, Kihara, Naoko, Seino, Yuriko, Sato, Hironobu, Miyagi, Ken, Minegishi, Shinya, Azuma, Tsukasa

Source: Journal of photopolymer science and technology. 29(1):11-16

Availability: http://explore.bl.uk/primo_library/libweb/action/display.do?tabs=detailsTab&gathStatTab=true&ct=display&fn=search&doc=ETOCRN607174841&indx=1&recIds=ETOCRN607174841

Fabrication of Sub—10 nm Metal Wire Circuits using Directed Self—Assembly of Block Copolymers

Authors: Azuma, Tsukasa, Seino, Yuriko, Sato, Hironobu, Kasahara, Yusuke, Kobayashi, Katsutoshi, Kubota, Hitoshi, Kanai, Hideki, Kodera, Katsuyoshi, Kihara, Naoko, Kawamonzen, Yoshiaki

Source: Journal of photopolymer science and technology. 29(5):647-652

Availability: http://explore.bl.uk/primo_library/libweb/action/display.do?tabs=detailsTab&gathStatTab=true&ct=display&fn=search&doc=ETOCRN607171073&indx=1&recIds=ETOCRN607171073

Sub-30 nm via interconnects fabricated using directed self-assembly

Authors: Kato, Hirokazu, Seino, Yuriko, Yonemitsu, Hiroki, Sato, Hironobu, Kanno, Masahiro, Kobayashi, Katsutoshi, Kawanishi, Ayako, Imamura, Tsubasa, Omura, Mitsuhiro, Nakamura, Naofumi, Azuma, Tsukasa

Source: In Microelectronic Engineering October 2013 110:152-155

A Simulation Study on Defectivity in Directed Self-assembly Lithography

Authors: Kodera, Katsuyoshi, Kanai, Hideki, Sato, Hironobu, Seino, Yuriko, Kobayashi, Katsutoshi, Kasahara, Yusuke, Kubota, Hitoshi, Kihara, Naoko, Kawamonzen, Yoshiaki, Minegishi, Shinya

Source: Journal of photopolymer science and technology. 28(5):683-688

Availability: http://explore.bl.uk/primo_library/libweb/action/display.do?tabs=detailsTab&gathStatTab=true&ct=display&fn=search&doc=ETOCRN601863477&indx=1&recIds=ETOCRN601863477

Vertical Oriented Lamellar Formation of Fluorine- and Silicon-containing Block Copolymers without Neutral Layers

Authors: Takano, Hiroki, Wang, Lei, Tanaka, Yuki, Maeda, Rina, Kihara, Naoko, Seino, Yuriko, Sato, Hironobu, Kawamonzen, Yoshiaki, Miyagi, Ken, Minegishi, Shinya

Source: Journal of photopolymer science and technology. 28(5):649-652

Availability: http://explore.bl.uk/primo_library/libweb/action/display.do?tabs=detailsTab&gathStatTab=true&ct=display&fn=search&doc=ETOCRN601863417&indx=1&recIds=ETOCRN601863417

A challenge to the Micro-phase Separation Limit of PS-b-PMMA by Doping with Hydrophilic Materials

Authors: Kawamonzen, Yoshiaki, Kihara, Naoko, Seino, Yuriko, Sato, Hironobu, Kasahara, Yusuke, Kobayashi, Katsutoshi, Kodera, Katsuyoshi, Kanai, Hideki, Kubota, Hitoshi, Miyagi, Ken

Source: Journal of photopolymer science and technology. 28(5):617-622

Availability: http://explore.bl.uk/primo_library/libweb/action/display.do?tabs=detailsTab&gathStatTab=true&ct=display&fn=search&doc=ETOCRN601863364&indx=1&recIds=ETOCRN601863364

Method of forming pattern and laminate

Direct In Situ Observation of the Early‐Stage Disorder–Order Evolution of Perpendicular Lamellae in Thermally Annealed High‐χ Block Copolymer Thin Films

Authors: Chandra, Alvin, Nakatani, Ryuichi, Uchiyama, Takumi, Seino, Yuriko, Sato, Hironobu, Kasahara, Yusuke, Azuma, Tsukasa, Hayakawa, Teruaki

Source: Advanced materials interfaces. 6(11)

Availability: http://explore.bl.uk/primo_library/libweb/action/display.do?tabs=detailsTab&gathStatTab=true&ct=display&fn=search&doc=ETOCvdc_100086939955.0x000001&indx=1&recIds=ETOCvdc_100086939955.0x000001

Self‐Assembly: Direct In Situ Observation of the Early‐Stage Disorder–Order Evolution of Perpendicular Lamellae in Thermally Annealed High‐χ Block Copolymer Thin Films (Adv. Mater. Interfaces 11/2019)

Authors: Chandra, Alvin, Nakatani, Ryuichi, Uchiyama, Takumi, Seino, Yuriko, Sato, Hironobu, Kasahara, Yusuke, Azuma, Tsukasa, Hayakawa, Teruaki

Source: Advanced materials interfaces. 6(11)

Availability: http://explore.bl.uk/primo_library/libweb/action/display.do?tabs=detailsTab&gathStatTab=true&ct=display&fn=search&doc=ETOCvdc_100083910819.0x000001&indx=1&recIds=ETOCvdc_100083910819.0x000001

Method of forming pattern

Pattern formation method

PATTERN FORMATION METHOD

PATTERN FORMING METHOD AND PATTERN FORMING DEVICE

PATTERN FORMATION METHOD

PATTERN FORMATION METHOD AND PATTERN FORMATION DEVICE

SEMICONDUCTOR DEVICE MANUFACTURING METHOD

SEMICONDUCTOR DEVICE MANUFACTURING METHOD

Pattern forming method, underlayer film forming composition, and method of manufacturing semiconductor device