Pulsed processing by cold plasma, applied to industrial emission control

Authors: E. J. M. Van Heesch, T. Huiskamp, K. Yan, F. J. C. M. Beckers, H. W. M. Smulders, G. J. J. Winands, R. H. P. Lemmens, P. P. M. Blom, S. Davalos Segura, W. F. L. M. Hoeben, S. V. B. Van Paasen, J. J. Van Oorschot, A. G. A. Bonkestoter, M. L. J. Van Den Brand, M. Hennink, R. W. J. Smulders, A. J. M. Pemen, P. C. T. Van Der Laan

Source: Frontiers in Chemistry, Vol 12 (2024)

Subject Terms: cold plasma, nanosecond pulses, pulsed processing, plasma processing, VOC, emission control, Chemistry, QD1-999

File Description: electronic resource

Relation: https://www.frontiersin.org/articles/10.3389/fchem.2024.1386055/full; https://doaj.org/toc/2296-2646

Access URL: https://doaj.org/article/40e3ccd3cc2c496bbc9abd60a7657904