The Formation of Ru/ZnO Multifunctional Bilayer through Area Selective Atomic Layer Deposition for Advanced Cu Metallization

Authors: Mori, Yuki, Cheon, Taehoon, Kotsugi, Yohei, Kim, Youn-Hye, Kwon, Woobin, Park, Young-Bae, Kim, Soo-Hyun

Source: 2023 IEEE International Interconnect Technology Conference (IITC) and IEEE Materials for Advanced Metallization Conference (MAM)(IITC/MAM) Advanced Metallization Conference (MAM)(IITC/MAM), 2023 IEEE International Interconnect Technology Conference (IITC) and IEEE Materials for. :1-3 May, 2023

Relation: 2023 IEEE International Interconnect Technology Conference (IITC) and IEEE Materials for Advanced Metallization Conference (MAM)(IITC/MAM)

Atomic layer deposition of RuO2 using a new metalorganic precursor as a diffusion barrier for Ru interconnect

Authors: Kim, Youn-Hye, Kotsugi, Yohei, Cheon, Taehoon, Ramesh, Rahul, Kim, Soo-Hyun

Source: 2021 IEEE International Interconnect Technology Conference (IITC) Interconnect Technology Conference (IITC), 2021 IEEE International. :1-3 Jul, 2021

Relation: 2021 IEEE International Interconnect Technology Conference (IITC)

Quantitative Two-Stage Classification of Gas Mixtures Using 2-D TMDC and PGM Chalcogenides

Authors: Sohn, Inkyu, An, Joungbin, Shin, Dain, Kim, Jaehyeok, Nakazawa, Tatsuya, Kotsugi, Yohei, Kim, Soo-Hyun, Yoon, Hwi, Shin, Won-Yong, Chung, Seung Min, Kim, Hyungjun

Source: IEEE sensors journal. 23(8):8154-8161

Availability: http://explore.bl.uk/primo_library/libweb/action/display.do?tabs=detailsTab&gathStatTab=true&ct=display&fn=search&doc=ETOCvdc_100179653435.0x000001&indx=1&recIds=ETOCvdc_100179653435.0x000001

Atomic Layer Deposition of Ru for Replacing Cu-Interconnects

Authors: Kotsugi, Yohei, Han, Seung-Min, Kim, Youn-Hye, Cheon, Taehoon, Nandi, Dip K., Ramesh, Rahul, Yu, Neung-Kyung, Son, Kirak, Tsugawa, Tomohiro, Ohtake, Shigeyuki

Source: Chemistry of materials. 33(14):5639-5651

Availability: http://explore.bl.uk/primo_library/libweb/action/display.do?tabs=detailsTab&gathStatTab=true&ct=display&fn=search&doc=ETOCRN632521662&indx=1&recIds=ETOCRN632521662

Self‐Formation of a Ru/ZnO Multifunctional Bilayer for the Next‐Generation Interconnect Technology via Area‐Selective Atomic Layer Deposition

Authors: Mori, Yuki, Cheon, Taehoon, Kotsugi, Yohei, Kim, Youn‐Hye, Park, Yejin, Ansari, Mohd Zahid, Mohapatra, Debananda, Jang, Yujin, Bae, Jong‐Seong, Kwon, Woobin, Kim, Gahui, Park, Young‐Bae, Lee, Han‐Bo‐Ram, Song, Wooseok, Kim, Soo‐Hyun

Source: Small. 19(34)

Availability: http://explore.bl.uk/primo_library/libweb/action/display.do?tabs=detailsTab&gathStatTab=true&ct=display&fn=search&doc=ETOCvdc_100191102798.0x000001&indx=1&recIds=ETOCvdc_100191102798.0x000001

Atomic Layer Deposited RuO2 Diffusion Barrier for Next Generation Ru‐Interconnects

Authors: Kim, Youn‐Hye, Kim, Minsu, Kotsugi, Yohei, Cheon, Taehoon, Mohapatra, Debananda, Jang, Yujin, Bae, Jong‐Seong, Hong, Tae Eun, Ramesh, Rahul, An, Ki‐Seok, Kim, Soo‐Hyun

Source: Advanced functional materials. 32(44)

Availability: http://explore.bl.uk/primo_library/libweb/action/display.do?tabs=detailsTab&gathStatTab=true&ct=display&fn=search&doc=ETOCvdc_100163515508.0x000001&indx=1&recIds=ETOCvdc_100163515508.0x000001

Atomic Layer Deposited RuO2 Diffusion Barrier for Next Generation Ru‐Interconnects.

Authors: Kim, Youn‐Hye, Kim, Minsu, Kotsugi, Yohei, Cheon, Taehoon, Mohapatra, Debananda, Jang, Yujin, Bae, Jong‐Seong, Hong, Tae Eun, Ramesh, Rahul, An, Ki‐Seok, Kim, Soo‐Hyun

Source: Advanced Functional Materials; 10/26/2022, Vol. 32 Issue 44, p1-9, 9p

Subject Terms: DIFFUSION barriers, ATOMIC layer deposition, MULTILAYERED thin films, DIFFUSION, THIN films, 3-D films

Development of RuS2 for near-infrared photodetector by atomic layer deposition and post-sulfurization.

Authors: Nakazawa, Tatsuya, Kim, Donghyun, Kim, Jaehyeok, Kotsugi, Yohei, Cheon, Taehoon, Chung, Seung-Min, Kim, Soo-Hyun, Kim, Hyungjun

Source: Rare Metals; Sep2022, Vol. 41 Issue 9, p3086-3099, 14p

Quantitative Two-Stage Classification of Gas Mixtures Using 2-D TMDC and PGM Chalcogenides

Authors: Sohn, Inkyu, An, Joungbin, Shin, Dain, Kim, Jaehyeok, Nakazawa, Tatsuya, Kotsugi, Yohei, Kim, Soo-Hyun, Yoon, Hwi, Shin, Won-Yong, Chung, Seung Min, Kim, Hyungjun

Source: IEEE Sensors Journal; 2023, Vol. 23 Issue: 8 p8154-8161, 8p

Metallic nanofilms on Si(100) and SiO2grown with a ruthenium precursor

Authors: Bolotov, Leonid, Kotsugi, Yohei, Tsugawa, Tomohiro, Asanuma, Shutaro, Uchida, Noriyuki

Source: Japanese Journal of Applied Physics; August 2024, Vol. 63 Issue: 8 p085502-085502, 1p