5 Tdot/inch2 bit-patterned media fabricated by directed self-assembling polymer mask

Authors: Kamata, Yoshiyuki, Maeda, Tomoyuki, Hieda, Hiroyuki, Yamamoto, Ryosuke, Kihara, Naoko, Kikitsu, Akira

Source: 2012 Digest APMRC APMRC, 2012 Digest. :1-2 Oct, 2012

Relation: 2012 Asia-Pacific Magnetic Recording Conference (APMRC)

Characterization of half-pitch 15-nm metal wire circuit fabricated by directed self-assembly of polystyrene-block-poly(methyl methacrylate)

Authors: Kasahara, Yusuke, Seino, Yuriko, Sato, Hironobu, Kanai, Hideki, Kobayashi, Katsutoshi, Kubota, Hitoshi, Miyagi, Ken, Minegishi, Shinya, Kodera, Katsuyoshi, Kihara, Naoko, Nomura, Satoshi, Tobana, Toshikatsu, Shiraishi, Masayuki, Kawamonzen, Yoshiaki, Azuma, Tsukasa

Source: In Microelectronic Engineering 15 June 2016 159:21-26

A novel simple sub-15 nm line-and-space patterning process flow using directed self-assembly technology

Authors: Seino, Yuriko, Kasahara, Yusuke, Sato, Hironobu, Kobayashi, Katsutoshi, Miyagi, Ken, Minegishi, Shinya, Kodera, Katsuyoshi, Kanai, Hideki, Tobana, Toshikatsu, Kihara, Naoko, Fujiwara, Tomoharu, Hirayanagi, Noriyuki, Kawamonzen, Yoshiaki, Azuma, Tsukasa

Source: In Microelectronic Engineering 20 February 2015 134:27-32

The Photopolymer Science and Technology Award

Authors: Takano, Hiroki, Wang, Lei, Tanaka, Yuki, Maeda, Rina, Kihara, Naoko, Seino, Yuriko, Sato, Hironobu, Miyagi, Ken, Minegishi, Shinya, Azuma, Tsukasa

Source: Journal of photopolymer science and technology. 29(1):11-16

Availability: http://explore.bl.uk/primo_library/libweb/action/display.do?tabs=detailsTab&gathStatTab=true&ct=display&fn=search&doc=ETOCRN607174841&indx=1&recIds=ETOCRN607174841

Precise Synthesis of Fluorine—containing Block Copolymers via RAFT

Authors: Nakatani, Ryuichi, Takano, Hiroki, Wang, Lei, Chandra, Alvin, Tanaka, Yuki, Maeda, Rina, Kihara, Naoko, Minegishi, Shinya, Miyagi, Ken, Kasahara, Yusuke

Source: Journal of photopolymer science and technology. 29(5):705-708

Availability: http://explore.bl.uk/primo_library/libweb/action/display.do?tabs=detailsTab&gathStatTab=true&ct=display&fn=search&doc=ETOCRN607171189&indx=1&recIds=ETOCRN607171189

Fabrication of Sub—10 nm Metal Wire Circuits using Directed Self—Assembly of Block Copolymers

Authors: Azuma, Tsukasa, Seino, Yuriko, Sato, Hironobu, Kasahara, Yusuke, Kobayashi, Katsutoshi, Kubota, Hitoshi, Kanai, Hideki, Kodera, Katsuyoshi, Kihara, Naoko, Kawamonzen, Yoshiaki

Source: Journal of photopolymer science and technology. 29(5):647-652

Availability: http://explore.bl.uk/primo_library/libweb/action/display.do?tabs=detailsTab&gathStatTab=true&ct=display&fn=search&doc=ETOCRN607171073&indx=1&recIds=ETOCRN607171073

A Simulation Study on Defectivity in Directed Self-assembly Lithography

Authors: Kodera, Katsuyoshi, Kanai, Hideki, Sato, Hironobu, Seino, Yuriko, Kobayashi, Katsutoshi, Kasahara, Yusuke, Kubota, Hitoshi, Kihara, Naoko, Kawamonzen, Yoshiaki, Minegishi, Shinya

Source: Journal of photopolymer science and technology. 28(5):683-688

Availability: http://explore.bl.uk/primo_library/libweb/action/display.do?tabs=detailsTab&gathStatTab=true&ct=display&fn=search&doc=ETOCRN601863477&indx=1&recIds=ETOCRN601863477

Vertical Oriented Lamellar Formation of Fluorine- and Silicon-containing Block Copolymers without Neutral Layers

Authors: Takano, Hiroki, Wang, Lei, Tanaka, Yuki, Maeda, Rina, Kihara, Naoko, Seino, Yuriko, Sato, Hironobu, Kawamonzen, Yoshiaki, Miyagi, Ken, Minegishi, Shinya

Source: Journal of photopolymer science and technology. 28(5):649-652

Availability: http://explore.bl.uk/primo_library/libweb/action/display.do?tabs=detailsTab&gathStatTab=true&ct=display&fn=search&doc=ETOCRN601863417&indx=1&recIds=ETOCRN601863417

Fabrication of Nanoparticle Films Applying Directed Self-assembly

Authors: Watanabe, Akira, Kihara, Naoko, Okino, Takeshi, Yamamoto, Ryousuke

Source: Journal of photopolymer science and technology. 28(5):643-648

Availability: http://explore.bl.uk/primo_library/libweb/action/display.do?tabs=detailsTab&gathStatTab=true&ct=display&fn=search&doc=ETOCRN601863400&indx=1&recIds=ETOCRN601863400

A challenge to the Micro-phase Separation Limit of PS-b-PMMA by Doping with Hydrophilic Materials

Authors: Kawamonzen, Yoshiaki, Kihara, Naoko, Seino, Yuriko, Sato, Hironobu, Kasahara, Yusuke, Kobayashi, Katsutoshi, Kodera, Katsuyoshi, Kanai, Hideki, Kubota, Hitoshi, Miyagi, Ken

Source: Journal of photopolymer science and technology. 28(5):617-622

Availability: http://explore.bl.uk/primo_library/libweb/action/display.do?tabs=detailsTab&gathStatTab=true&ct=display&fn=search&doc=ETOCRN601863364&indx=1&recIds=ETOCRN601863364

Long-range-ordering of self-assembled block copolymer nanodots using EB-drawn guide line and post mixing template

Authors: Hosaka, Sumio, Akahane, Takashi, Huda, Miftakhul, Tamura, Takuro, Yin, You, Kihara, Naoko, Kamata, Yoshiyuki, Kitsutsu, Akira

Source: In Microelectronic Engineering August 2011 88(8):2571-2575

Pattern forming method

5 Tdots/in 2 bit patterned media fabricated by a directed self-assembly mask

Authors: Kikitsu, Akira, Maeda, Tomoyuki, Hieda, Hiroyuki, Yamamoto, Ryosuke, Kihara, Naoko, Kamata, Yoshiyuki

Source: IEEE transactions on magnetics. 49(2):693-698

Availability: http://explore.bl.uk/primo_library/libweb/action/display.do?tabs=detailsTab&gathStatTab=true&ct=display&fn=search&doc=ETOCvdc_100094353236.0x000001&indx=1&recIds=ETOCvdc_100094353236.0x000001

Fabrication of Ridge-and-Groove Servo Pattern Consisting of Self-Assembled Dots for 2.5 $\hbox{Tb/in}^{2}$ Bit Patterned Media

Authors: Kamata, Yoshiyuki, Kikitsu, Akira, Kihara, Naoko, Morita, Seiji, Kimura, Kaori, Izumi, Haruhiko

Source: IEEE transactions on magnetics. 47(1):51-54

Availability: http://explore.bl.uk/primo_library/libweb/action/display.do?tabs=detailsTab&gathStatTab=true&ct=display&fn=search&doc=ETOCvdc_100094372075.0x000001&indx=1&recIds=ETOCvdc_100094372075.0x000001

Method of manufacturing mold

Magnetic recording medium

Method of forming fine pattern

Method of forming a pattern

MAGNETIC RECORDING MEDIUM AND METHOD OF MANUFACTURING THE SAME

METHOD FOR PRODUCING IMPRINT MOLD AND MAGNETIC RECORDING MEDIUM