Emergency laparoscopic sigmoid colectomy with primary anastomosis for Hinchey stages III and IV diverticulitis

Authors: Chikaraishi, Kentaro, Kaneko, Kenjiro, Kanai, Hideki, Kobayashi, Tetsuya, Tanabe, Yoshiaki

Source: Asian journal of endoscopic surgery. 16(3):613-616

Availability: http://explore.bl.uk/primo_library/libweb/action/display.do?tabs=detailsTab&gathStatTab=true&ct=display&fn=search&doc=ETOCvdc_100186397835.0x000001&indx=1&recIds=ETOCvdc_100186397835.0x000001

Strategies for single patterning of contacts for 32nm and 28nm technology

Authors: Morgenfeld, Bradley, Stobert, Ian, Haffner, Henning, An, Juj, Kanai, Hideki, Ostermayr, Martin, Chen, Norman, Aminpur, Massud, Brodsky, Colin, Thomas, Alan

Source: 2011 IEEE/SEMI Advanced Semiconductor Manufacturing Conference Advanced Semiconductor Manufacturing Conference (ASMC), 2011 22nd Annual IEEE/SEMI. :1-8 May, 2011

Relation: 2011 22nd Annual IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC)

Characterization of half-pitch 15-nm metal wire circuit fabricated by directed self-assembly of polystyrene-block-poly(methyl methacrylate)

Authors: Kasahara, Yusuke, Seino, Yuriko, Sato, Hironobu, Kanai, Hideki, Kobayashi, Katsutoshi, Kubota, Hitoshi, Miyagi, Ken, Minegishi, Shinya, Kodera, Katsuyoshi, Kihara, Naoko, Nomura, Satoshi, Tobana, Toshikatsu, Shiraishi, Masayuki, Kawamonzen, Yoshiaki, Azuma, Tsukasa

Source: In Microelectronic Engineering 15 June 2016 159:21-26

The Photopolymer Science and Technology Award

Authors: Yoshimoto, Kenji, Yoshida, Akihisa, Ohshima, Masahiro, Taniguchi, Takashi, Kodera, Katsuyoshi, Naka, Yoshihiro, Kanai, Hideki, Kobayashi, Sachiko, Maeda, Shimon, Jiravanichsakul, Phubes

Source: Journal of photopolymer science and technology. 30(1):7-12

Availability: http://explore.bl.uk/primo_library/libweb/action/display.do?tabs=detailsTab&gathStatTab=true&ct=display&fn=search&doc=ETOCRN611967730&indx=1&recIds=ETOCRN611967730

A novel simple sub-15 nm line-and-space patterning process flow using directed self-assembly technology

Authors: Seino, Yuriko, Kasahara, Yusuke, Sato, Hironobu, Kobayashi, Katsutoshi, Miyagi, Ken, Minegishi, Shinya, Kodera, Katsuyoshi, Kanai, Hideki, Tobana, Toshikatsu, Kihara, Naoko, Fujiwara, Tomoharu, Hirayanagi, Noriyuki, Kawamonzen, Yoshiaki, Azuma, Tsukasa

Source: In Microelectronic Engineering 20 February 2015 134:27-32

Direct Self—Assembly for Non—Periodic Designs

Authors: Yoshimoto, Kenji, Yoshida, Akihisa, Ohshima, Masahiro, Kodera, Katsuyoshi, Naka, Yoshihiro, Kanai, Hideki, Kobayashi, Sachiko, Maeda, Simon, Jiravanichsakul, Phubes, Kobayashi, Katsutoshi

Source: Journal of photopolymer science and technology. 29(5):709-716

Availability: http://explore.bl.uk/primo_library/libweb/action/display.do?tabs=detailsTab&gathStatTab=true&ct=display&fn=search&doc=ETOCRN607171190&indx=1&recIds=ETOCRN607171190

Fabrication of Sub—10 nm Metal Wire Circuits using Directed Self—Assembly of Block Copolymers

Authors: Azuma, Tsukasa, Seino, Yuriko, Sato, Hironobu, Kasahara, Yusuke, Kobayashi, Katsutoshi, Kubota, Hitoshi, Kanai, Hideki, Kodera, Katsuyoshi, Kihara, Naoko, Kawamonzen, Yoshiaki

Source: Journal of photopolymer science and technology. 29(5):647-652

Availability: http://explore.bl.uk/primo_library/libweb/action/display.do?tabs=detailsTab&gathStatTab=true&ct=display&fn=search&doc=ETOCRN607171073&indx=1&recIds=ETOCRN607171073

A Simulation Study on Defectivity in Directed Self-assembly Lithography

Authors: Kodera, Katsuyoshi, Kanai, Hideki, Sato, Hironobu, Seino, Yuriko, Kobayashi, Katsutoshi, Kasahara, Yusuke, Kubota, Hitoshi, Kihara, Naoko, Kawamonzen, Yoshiaki, Minegishi, Shinya

Source: Journal of photopolymer science and technology. 28(5):683-688

Availability: http://explore.bl.uk/primo_library/libweb/action/display.do?tabs=detailsTab&gathStatTab=true&ct=display&fn=search&doc=ETOCRN601863477&indx=1&recIds=ETOCRN601863477

A challenge to the Micro-phase Separation Limit of PS-b-PMMA by Doping with Hydrophilic Materials

Authors: Kawamonzen, Yoshiaki, Kihara, Naoko, Seino, Yuriko, Sato, Hironobu, Kasahara, Yusuke, Kobayashi, Katsutoshi, Kodera, Katsuyoshi, Kanai, Hideki, Kubota, Hitoshi, Miyagi, Ken

Source: Journal of photopolymer science and technology. 28(5):617-622

Availability: http://explore.bl.uk/primo_library/libweb/action/display.do?tabs=detailsTab&gathStatTab=true&ct=display&fn=search&doc=ETOCRN601863364&indx=1&recIds=ETOCRN601863364

Effect of sacubitril/valsartan on natriuretic peptide in patients with compensated heart failure.

Authors: Shirakabe, Akihiro, Matsushita, Masato, Sawatani, Tomofumi, Noma, Satsuki, Takayasu, Tsutomu, Kanai, Hideki, Asano, Miwako, Nomura, Akiko, Asai, Kuniya

Source: Heart & Vessels; Jun2023, Vol. 38 Issue 6, p773-784, 12p

Subject Terms: FUROSEMIDE, PEPTIDES, HEART failure patients, ATRIAL natriuretic peptides, ENTRESTO, ACE inhibitors

Generating image inspection data from subtracted corner-processed design data

Method of evaluating a photo mask and method of manufacturing a semiconductor device

Reticle, apparatus for monitoring optical system, method for monitoring optical system, and method for manufacturing reticle

Photomask correcting method and manufacturing method of semiconductor device

Method of correcting mask data, method of manufacturing a mask and method of manufacturing a semiconductor device

METHOD OF EVALUATING A PHOTO MASK AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

Mask, manufacturing method for mask, and manufacturing method for semiconductor device

Reticle, apparatus for monitoring optical system, method for monitoring optical system, and method for manufacturing reticle

Photomask correcting method and manufacturing method of semiconductor device

Reticle, apparatus for monitoring optical system, method for monitoring optical system, and method for manufacturing reticle