-
1Academic Journal
Source: IEEE Transactions on Electron Devices IEEE Trans. Electron Devices Electron Devices, IEEE Transactions on. 71(10):6236-6243 Oct, 2024
-
2Conference
Authors: Trinidad, Juan Carlos Perez, Agustin, Marco Antonio Vasquez, Salgado, Godofredo Garcia, Trujillo, Roman Romano, Marcos, Fernando Lopez, Vilchis, Heber, Andres, Enrique Rosendo, Arciniega, Jose Juan Gervacio, Martinez, Orlando Cortazar, Solis, Antonio Coyopol
Source: 2023 20th International Conference on Electrical Engineering, Computing Science and Automatic Control (CCE) Electrical Engineering, Computing Science and Automatic Control (CCE), 2023 20th International Conference on. :1-7 Oct, 2023
Relation: 2023 20th International Conference on Electrical Engineering, Computing Science and Automatic Control (CCE)
-
3Academic Journal
Authors: Xochitl Aleyda Morán Martínez, José Alberto Luna López, Zaira Jocelyn Hernández Simón, Gabriel Omar Mendoza Conde, José Álvaro David Hernández de Luz, Godofredo García Salgado
Source: Beilstein Journal of Nanotechnology, Vol 15, Iss 1, Pp 1627-1638 (2024)
Subject Terms: 2d model, chemical reactions, flow dynamics, hfcvd, hot filament chemical vapor deposition, siox films, Technology, Chemical technology, TP1-1185, Science, Physics, QC1-999
File Description: electronic resource
Relation: https://doaj.org/toc/2190-4286
-
4Academic Journal
Authors: Jatinder Pal Singh, Ajay Kumar Sao, Babita Sharma, Satyam Garg, Anjali Sharma, Reema Gupta, Lokesh Rana, Mallika Verma, Akhilesh Pandey, Archibald Theodore Nimal, Upendra Mittal, Amit Kumar Vishwakarma, Monika Tomar, Arijit Chowdhuri
Source: Chemical Physics Impact, Vol 10, Iss , Pp 100833- (2025)
Subject Terms: Lamb wave, Surface acoustic wave, Diamond like carbon, Zinc oxide, Hot filament chemical vapor deposition (HFCVD), Physics, QC1-999, Chemistry, QD1-999
File Description: electronic resource
Relation: http://www.sciencedirect.com/science/article/pii/S2667022425000210; https://doaj.org/toc/2667-0224
-
5Academic Journal
Authors: Shaohua Lu, Xiongtao Zhang, Yuhao Zheng, Meiyan Jiang, Chengke Chen, Xiaojun Hu
Source: Functional Diamond, Vol 4, Iss 1 (2024)
Subject Terms: diamond film, hfcvd, tac, diamond(111)/tac(111) interface, graphite(002)/tac(111) interface, Materials of engineering and construction. Mechanics of materials, TA401-492
File Description: electronic resource
Relation: https://doaj.org/toc/2694-1120
-
6Academic Journal
Growth mechanisms and material properties of boron-doped single crystal diamond synthesized by HFCVD
Authors: Lu, Ming a, ⁎, Zhang, Chuan b, Sun, Fanghong b
Source: In Surfaces and Interfaces 1 April 2025 62
-
7Conference
Authors: Panyalert, Wasin, Siriwongrungson, Vilailuck, Suwanna, Prapakron, Titiroongruang, Wisut, Niemcharoen, Surasak
Source: 2018 15th International Conference on Electrical Engineering/Electronics, Computer, Telecommunications and Information Technology (ECTI-CON) Electrical Engineering/Electronics, Computer, Telecommunications and Information Technology (ECTI-CON), 2018 15th International Conference on. :509-512 Jul, 2018
Relation: 2018 15th International Conference on Electrical Engineering/Electronics, Computer, Telecommunications and Information Technology (ECTI-CON)
-
8Academic Journal
Authors: Haixia YANG, Mingjiang FU, Jian LUO, Tao ZHANG
Source: Jin'gangshi yu moliao moju gongcheng, Vol 43, Iss 6, Pp 735-742 (2023)
Subject Terms: hot filament chemical vapor deposition (hfcvd), fluent simulation software, optimized model, uniform growth of diamond particles, Materials of engineering and construction. Mechanics of materials, TA401-492, Mechanical engineering and machinery, TJ1-1570
File Description: electronic resource
Relation: https://doaj.org/toc/1006-852X
-
9Academic Journal
Effect of Si3N4 substrate surface roughness on the wear resistance of diamond film prepared by HFCVD
Authors: He WANG, Kaixiang WEN, Guangyu YAN, Yanxiang WANG, Yifan JIN, Peichen SU
Source: Jin'gangshi yu moliao moju gongcheng, Vol 43, Iss 5, Pp 604-611 (2023)
Subject Terms: si3n4, surface roughness, hot filament chemical vapour deposition (hfcvd), diamond films, wear resistance, Materials of engineering and construction. Mechanics of materials, TA401-492, Mechanical engineering and machinery, TJ1-1570
File Description: electronic resource
Relation: https://doaj.org/toc/1006-852X
-
10Academic Journal
Authors: Gaydaychuk, A. ⁎, Linnik, S., Mitulinsky, A., Bulakh, V., Zenkin, S.
Source: In Surfaces and Interfaces February 2024 45
-
11Academic Journal
Authors: Wang, Xinchang a, ∗, Liu, Enzhi b, Li, Weihan b, Qiao, Yu a, Sun, Fanghong a, Shu, Da b, ∗∗
Source: In Journal of Cleaner Production 1 January 2024 434
-
12Conference
Source: 2017 14th International Conference on Electrical Engineering/Electronics, Computer, Telecommunications and Information Technology (ECTI-CON) Electrical Engineering/Electronics, Computer, Telecommunications and Information Technology (ECTI-CON), 2017 14th International Conference on. :274-277 Jun, 2017
Relation: 2017 14th International Conference on Electrical Engineering/Electronics, Computer, Telecommunications and Information Technology (ECTI-CON)
-
13Academic Journal
Source: Shanghai Jiaotong Daxue xuebao, Vol 57, Iss 8, Pp 1078-1085 (2023)
Subject Terms: hot filament chemical vapor deposition (hfcvd), diamond film, growth rate, quality, heat dissipation, Engineering (General). Civil engineering (General), TA1-2040, Chemical engineering, TP155-156, Naval architecture. Shipbuilding. Marine engineering, VM1-989
File Description: electronic resource
-
14Academic Journal
Authors: Marcos Palacios Bonilla, Godofredo García Salgado, Antonio Coyopol Solís, Román Romano Trujillo, Fabiola Gabriela Nieto Caballero, Enrique Rosendo Andrés, Crisóforo Morales Ruiz, Justo Miguel Gracia Jiménez, Reina Galeazzi Isasmendi
Source: Crystals, Vol 14, Iss 6, p 491 (2024)
Subject Terms: HFCVD, silicon, ZnO-Nd, sea urchin, Crystallography, QD901-999
File Description: electronic resource
-
15Academic Journal
Authors: Lu, Ming, Liu, Dongdong, Zhang, Chuan, Sun, Fanghong ⁎
Source: In Applied Surface Science 1 March 2023 612
-
16Academic Journal
Authors: Hideaki Yamada, Takehiro Shimaoka
Source: Functional Diamond, Vol 2, Iss 1, Pp 46-52 (2022)
Subject Terms: hfcvd, b-doping, semiconductor, Materials of engineering and construction. Mechanics of materials, TA401-492
File Description: electronic resource
Relation: https://doaj.org/toc/2694-1120
-
17Academic Journal
Authors: Prabhakaran, G. Selva a, Das, Ritu b, Rao, M.S. Ramachandra b, Bhattacharya, S.S. a, ⁎
Source: In Surface & Coatings Technology 15 July 2022 441
-
18Academic Journal
Authors: Mohammad Imran, Eun-Bi Kim, Tae-Geum Kim, Sadia Ameen, Mohammad Shaheer Akhtar, Dong-Heui Kwak
Source: Micromachines, Vol 15, Iss 4, p 441 (2024)
Subject Terms: WO3, HFCVD, nanowalls, methylamine, electrochemical sensor, cyclic voltammetry, Mechanical engineering and machinery, TJ1-1570
File Description: electronic resource
-
19Academic Journal
Authors: Jiang, F., Li, Q., Leng, Y. X., Huang, N.
Source: IEEE Transactions on Plasma Science IEEE Trans. Plasma Sci. Plasma Science, IEEE Transactions on. 40(7):1829-1836 Jul, 2012
-
20Conference
Authors: Chae, Kyo Won, Koh, Ken ha, Lee, Soonil
Source: 2007 2nd IEEE International Conference on Nano/Micro Engineered and Molecular Systems Nano/Micro Engineered and Molecular Systems, 2007. NEMS '07. 2nd IEEE International Conference on. :575-579 Jan, 2007
Relation: 2007 2nd IEEE International Conference on Nano/Micro Engineered and Molecular Systems