Precursor‐Derived Sensing Interdigitated Electrode Microstructures Based on Platinum and Nano Porous Carbon.

Authors: Mielewczyk, Lukas¹ (AUTHOR), Galle, Lydia¹ (AUTHOR), Niese, Nick¹ (AUTHOR), Grothe, Julia¹ (AUTHOR) julia.grothe@tu-dresden.de, Kaskel, Stefan¹ (AUTHOR)

Source: ChemistryOpen. Nov2024, Vol. 13 Issue 11, p1-6. 6p.

Subject Terms: *ELECTRON beam lithography, *NANOIMPRINT lithography, *CARBON electrodes, *MICROSENSORS, *PLATINUM

Numerical and Experimental Demonstration of a Silicon Nitride-Based Ring Resonator Structure for Refractive Index Sensing.

Authors: Butt, Muhammad A.¹, aleksandra.bieniek.dokt@pw.edu.plali.butt@pw.edu.pl, Kozłowski, Łukasz¹, Golas, Michał^2,3, marcin.juchniewicz@pw.edu.pl, Slowikowski, Mateusz², Filipiak, Maciej², Juchniewicz, Marcin², Bieniek-Kaczorek, Aleksandra¹, Dudek, Michał⁴, michal.dudek@wat.edu.pl, Piramidowicz, Ryszard¹

Source: Applied Sciences (2076-3417); Jul2024, Vol. 14 Issue 14, p6082, 14p

Bowtie Nanoantenna LSPR Biosensor for Early Prediction of Preeclampsia.

Authors: Yi, Ke^1,2, Ao, Mengyin¹, Ding, Ting¹, Zheng, Danxi¹, Li, Lin^1,2, lilin0119@scu.edu.cn

Source: Biosensors (2079-6374); Jul2024, Vol. 14 Issue 7, p317, 13p

Investigation of vacuum measurement by nano‐gap device.

Authors: Komiya, Kazuki^1,2 (AUTHOR) komiya.kazuki@iri-tokyo.jp, Nagata, Koki¹ (AUTHOR), Yamaoka, Hidehiko¹ (AUTHOR), Date, Shuichi¹ (AUTHOR), Miyashita, Yuito¹ (AUTHOR), Yan, Min² (AUTHOR)

Source: Electronics & Communications in Japan. Mar2024, Vol. 107 Issue 1, p1-5. 5p.

Subject Terms: Electron beam lithography, Electric fields, Microfabrication

HEMT With Ultralow Contact Resistance by Room Temperature Process With One-Step EBL T-Shape Gates for Subterahertz Applications: Design, Fabrication, and Characterization

Authors: Cheng, H., Wang, J., Kelly, J., Ofiare, A., Thoms, S., Li, C.

Source: IEEE Transactions on Electron Devices IEEE Trans. Electron Devices Electron Devices, IEEE Transactions on. 72(1):142-146 Jan, 2025

Exceptional Lithography Sensitivity Boosted by Hexafluoroisopropanols in Photoresists.

Authors: Liu, Junjun¹ (AUTHOR) junjun-liu0710@outlook.com, Wang, Dong¹ (AUTHOR), Li, Yitan¹ (AUTHOR), Wang, Haihua¹ (AUTHOR), Chen, Huan¹ (AUTHOR), Wang, Qianqian¹ (AUTHOR) wangqq2021@sdu.edu.cn, Kang, Wenbing¹ (AUTHOR) wangqq2021@sdu.edu.cn

Source: Polymers (20734360). Mar2024, Vol. 16 Issue 6, p825. 10p.

Subject Terms: *PHOTORESISTS, *ELECTRON beam lithography, *LITHOGRAPHY, *ELECTRON beams

ELECTRON BEAM LITHOGRAPHY PROCESS QUALITY IMPROVEMENT BY ROBUST ENGINEERING APPROACH.

Authors: Koleva, Lilyana¹, Asenova-Robinzonova, Asya¹, Koleva, Elena^1,2 eligeorg@uctm.edu

Source: Journal of Chemical Technology & Metallurgy. 2024, Vol. 59 Issue 2, p439-450. 12p.

Subject Terms: *ELECTRON beam lithography, *ELECTRON beams, *PRODUCTION planning, *MANUFACTURING processes, *ENGINEERING

Lithographically Ordered FePt L1 0 Dots with High Coercivity for Logic-Conditioned Magnetic Nanostructures.

Authors: Crisan, Ovidiu¹, alina.crisan@infim.roocrisan@infim.ro, Crisan, Alina Daniela¹

Source: Crystals (2073-4352); Jan2024, Vol. 14 Issue 1, p58, 12p

Deterministic Fabrication of Fluorescent Nanostructures Featuring Distinct Optical Transitions.

Authors: Rikers, Marijn^1,2,3 (AUTHOR), Bashiri, Ayesheh^1,2 (AUTHOR), Barreda, Ángela^1,2,4 (AUTHOR), Steinert, Michael² (AUTHOR), Choi, Duk-Yong³ (AUTHOR), Pertsch, Thomas^2,5,6 (AUTHOR), Staude, Isabelle^1,2,6 (AUTHOR) isabelle.staude@uni-jena.de

Source: Nanomaterials (2079-4991). Feb2025, Vol. 15 Issue 3, p219. 12p.

Subject Terms: *ELECTRON beam lithography, *OPACITY (Optics), *MAGNETIC transitions, *FLUORESCENT polymers, *MAGNETIC dipoles

Quantitative evaluation of residual resist in electron beam lithography based on scanning electron microscopy imaging and thresholding segmentation algorithm.

Authors: Mao, Qingyuan^1,2,3 (AUTHOR), Zhu, Jingyuan^1,2,3 (AUTHOR) 24068@tongji.edu.cn, Wang, Zhanshan^1,2,3,4 (AUTHOR)

Source: Nanotechnology. 1/27/2025, Vol. 36 Issue 4, p1-9. 9p.

Subject Terms: *ELECTRON beam lithography, *THRESHOLDING algorithms, *EXPOSURE dose, *SCANNING electron microscopy, *GRAYSCALE model

Reliable fabrication of 3D freestanding nanostructures via all dry stacking of incompatible photoresist.

Authors: Shu, Zhiwen^1,2 (AUTHOR), Liang, Huikang^1,2 (AUTHOR), Chen, Lei^1,2 (AUTHOR), Liu, Qing³ (AUTHOR), Zeng, Pei⁴ (AUTHOR), Zhou, Yuting⁵ (AUTHOR), Wang, Quan^1,2 (AUTHOR), Fan, Fu^1,2 (AUTHOR), Zhou, Yu^1,2 (AUTHOR), Chen, Yiqin^1,2 (AUTHOR), Feng, Bo^1,2 (AUTHOR) fengbo36@hnu.edu.cn, Duan, Huigao^1,2,6 (AUTHOR)

Source: Nanotechnology. 1/13/2025, Vol. 36 Issue 2, p1-8. 8p.

Subject Terms: *ELECTRON beam lithography, *CAVITY resonators, *PHOTORESISTS, *NANOELECTRONICS, *NANOSTRUCTURES

Electron microscopy of seismic waves.

Authors: Chen, Shaoqing^1,2 (AUTHOR), Wang, Mengyao³ (AUTHOR), He, Dong Sheng⁴ (AUTHOR) heds@sustech.edu.cn

Source: Journal of Microscopy. Jan2025, Vol. 297 Issue 1, p3-12. 10p.

Subject Terms: *SEISMIC waves, *ELECTRON beam lithography, *ELECTRON microscopes, *FREQUENCIES of oscillating systems, *FREE vibration, *SCANNING transmission electron microscopy

Efficient Calculation of Charging Effects in Electron Beam Lithography Using the SA-AMG

Authors: Ma, W., Yao, K., Zhong, X., Liu, J.

Source: IEEE Electron Device Letters IEEE Electron Device Lett. Electron Device Letters, IEEE. 45(10):1945-1948 Oct, 2024

Research on the Controllable Growth of Gold Nanopillars by Nanohole Templates on Gold-Plated Substrates

Authors: Wu, Xiaomin, Song, Zhengxun, Li, Li, Wang, Lu, Wang, Zuobin

Source: 2024 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO) Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO), 2024 IEEE International Conference on. :418-422 Jul, 2024

Relation: 2024 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO)

Three-Dimensional Proximity Effect Correction in Electron Beam Lithography

Authors: Zhang, Yuteng, Liu, Zhuming, Liang, Xihui, Wang, Kaiyao, Li, Quantong

Source: 2024 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO) Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO), 2024 IEEE International Conference on. :278-283 Jul, 2024

Relation: 2024 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO)

Nano-Scale Fabrication and Characterization of Modified Re-Entrant Structures with Curved Corners Using EBL

Authors: Bora, Kaustav Moni, Dey, Ujjal, Varshney, Shailendra Kumar, Kumar, Cheuruvu Siva

Source: 2024 International Conference on Manipulation, Automation and Robotics at Small Scales (MARSS) Manipulation, Automation and Robotics at Small Scales (MARSS), 2024 International Conference on. :1-6 Jul, 2024

Relation: 2024 International Conference on Manipulation, Automation and Robotics at Small Scales (MARSS)

Circular dichroism of pseudo-two-dimensional metal nanostructures: Rotational symmetry and reciprocity.

Authors: Endo, Kensaku¹ (AUTHOR), Hashiyada, Shun^2,3 (AUTHOR), Narushima, Tetsuya^2,3 (AUTHOR), Togawa, Yoshihiko¹ (AUTHOR) ytogawa@omu.ac.jp, Okamoto, Hiromi^2,3 (AUTHOR) aho@ims.ac.jp

Source: Journal of Chemical Physics. 12/21/2023, Vol. 159 Issue 23, p1-10. 10p.

Subject Terms: *ROTATIONAL symmetry, *ELECTRON beam lithography, *OPTICAL measurements, *NANOSTRUCTURES, *RECIPROCITY (Psychology)

Recent Advances in Patterning Strategies for Full-Color Perovskite Light-Emitting Diodes.

Authors: Lee, Gwang Heon¹ (AUTHOR), Kim, Kiwook² (AUTHOR), Kim, Yunho¹ (AUTHOR), Yang, Jiwoong^2,3 (AUTHOR) jiwoongyang@dgist.ac.kr, Choi, Moon Kee^1,4,5 (AUTHOR) mkchoi@unist.ac.kr

Source: Nano-Micro Letters. 12/7/2023, Vol. 16 Issue 1, p1-39. 39p.

Subject Terms: *LIGHT emitting diodes, *ELECTRON beam lithography, *PEROVSKITE, *TRANSFER printing, *LASER ablation, *METAL halides

Highly Coercive L1 0 -Phase Dots Obtained through Low Temperature Annealing for Nano-Logic Magnetic Structures.

Authors: Crisan, Ovidiu¹, ocrisan@yahoo.com, Crisan, Alina Daniela¹, Schinteie, Gabriel¹, Kuncser, Victor¹, kuncser@infim.ro

Source: Coatings (2079-6412); Dec2023, Vol. 13 Issue 12, p2068, 12p

High-performance grating couplers on 220-nm thick silicon by inverse design for perfectly vertical coupling.

Authors: Yang, Mingxiang^1,2 (AUTHOR), Yan, Yunjie¹ (AUTHOR), Wu, Zhenlin¹ (AUTHOR), Gu, YiYing¹ (AUTHOR), Zhao, Shiyuan¹ (AUTHOR), Morthier, Geert² (AUTHOR), Zhao, Mingshan¹ (AUTHOR) mszhao@dlut.edu.cn

Source: Scientific Reports. 11/20/2023, Vol. 13 Issue 1, p1-9. 9p.

Subject Terms: *ELECTRON beam lithography, *GAUSSIAN beams