PECVD and PEALD on polymer substrates (part I): Fundamentals and analysis of plasma activation and thin film growth

Authors: Arcos, Teresa de los, Awakowicz, Peter, Benedikt, Jan, Biskup, Beatrix, Böke, Marc, Boysen, Nils, Buschhaus, Rahel, Dahlmann, Rainer, Devi, Anjana, Gergs, Tobias, Jenderny, Jonathan, von Keudell, Achim, Kühne, Thomas D., Kusmierz, Simon, Müller, Hendrik, Mussenbrock, Thomas, Trieschmann, Jan, Zanders, David, Zysk, Frederik, Grundmeier, Guido

Subject Terms: Condensed Matter - Soft Condensed Matter, Condensed Matter - Materials Science

Access URL: http://arxiv.org/abs/2307.00011

The role of fluorination during the physicochemical erosion of yttria in fluorine-based etching plasmas

Authors: Kindelmann, Moritz ^*, Weber, Moritz L., Stamminger, Mark, Buschhaus, Rahel, Wessel, Egbert, Bram, Martin, Guillon, Olivier

Source: In Journal of the European Ceramic Society February 2022 42(2):561-566

Processing map to control the erosion of Y2O3 in fluorine based etching plasmas

Authors: Kindelmann, Moritz, Weber, Moritz L(ukas), Stamminger, Mark, Buschhaus, Rahel, Breuer, Uwe, Bram, Martin, Guillon, Olivier

Source: Journal of the American Ceramic Society. 105(5):3498-3509

Availability: http://explore.bl.uk/primo_library/libweb/action/display.do?tabs=detailsTab&gathStatTab=true&ct=display&fn=search&doc=ETOCvdc_100149660626.0x000001&indx=1&recIds=ETOCvdc_100149660626.0x000001

PECVD and PEALD on polymer substrates (part I): Fundamentals and analysis of plasma activation and thin film growth.

Authors: de los Arcos, Teresa, Awakowicz, Peter, Benedikt, Jan, Biskup, Beatrix, Böke, Marc, Boysen, Nils, Buschhaus, Rahel, Dahlmann, Rainer, Devi, Anjana, Gergs, Tobias, Jenderny, Jonathan, von Keudell, Achim, Kühne, Thomas D., Kusmierz, Simon, Müller, Hendrik, Mussenbrock, Thomas, Trieschmann, Jan, Zanders, David, Zysk, Frederik, Grundmeier, Guido

Source: Plasma Processes & Polymers; Feb2024, Vol. 21 Issue 2, p1-22, 22p

Subject Terms: PLASMA-enhanced chemical vapor deposition, ATOMIC layer deposition, PLASMA chemistry, BLOOD volume, SURFACE chemistry, THIN films, POLYMER films

SiO2 microstructure evolution during plasma deposition analyzed via ellipsometric porosimetry

Authors: Buschhaus, Rahel, Keudell, Achim

Source: Plasma processes and polymers. 17(4)

Availability: http://explore.bl.uk/primo_library/libweb/action/display.do?tabs=detailsTab&gathStatTab=true&ct=display&fn=search&doc=ETOCvdc_100106952074.0x000001&indx=1&recIds=ETOCvdc_100106952074.0x000001

SiO2 microstructure evolution during plasma deposition analyzed via ellipsometric porosimetry

Authors: Buschhaus, Rahel, Keudell, Achim

Source: Plasma processes and polymers. 16(9)

Availability: http://explore.bl.uk/primo_library/libweb/action/display.do?tabs=detailsTab&gathStatTab=true&ct=display&fn=search&doc=ETOCvdc_100091413020.0x000001&indx=1&recIds=ETOCvdc_100091413020.0x000001

Processing map to control the erosion of Y2O3 in fluorine based etching plasmas.

Authors: Kindelmann, Moritz, Weber, Moritz L, Stamminger, Mark, Buschhaus, Rahel, Breuer, Uwe, Bram, Martin, Guillon, Olivier

Source: Journal of the American Ceramic Society; May2022, Vol. 105 Issue 5, p3498-3509, 12p, 2 Color Photographs, 4 Black and White Photographs, 1 Diagram, 1 Chart, 1 Graph

Subject Terms: PLASMA etching, PLASMA gases, YTTRIUM oxides, FLUORINE

SiO2 microstructure evolution during plasma deposition analyzed via ellipsometric porosimetry.

Authors: Buschhaus, Rahel¹ (AUTHOR) rahel.buschhaus@rub.de, Keudell, Achim¹ (AUTHOR)

Source: Plasma Processes & Polymers. Apr2020, Vol. 17 Issue 4, p1-1. 1p.

Subject Terms: *PLASMA deposition, *BIOLOGICAL evolution

SiO2 microstructure evolution during plasma deposition analyzed via ellipsometric porosimetry.

Authors: Buschhaus, Rahel¹ (AUTHOR) rahel.buschhaus@rub.de, Keudell, Achim¹ (AUTHOR)

Source: Plasma Processes & Polymers. Sep2019, Vol. 16 Issue 9, pN.PAG-N.PAG. 1p.

Subject Terms: *PLASMA deposition, *MICROWAVE plasmas, *PARTIAL pressure, *PLASMA sources, *MICROSTRUCTURE, *PLASMA pressure