Trapped radical behavior of electron beam irradiated polytetrafluoroethylene fine powder at various temperatures

Authors: Akihiro Oshima, Hiroto Horiuchi, Atsushi Nakamura, Shun Kobayashi, Ayana Terui, Ayano Mino, Ryoya Shimura, Masakazu Washio

Source: Scientific Reports, Vol 11, Iss 1, Pp 1-7 (2021)

Subject Terms: Medicine, Science

File Description: electronic resource

Relation: https://doaj.org/toc/2045-2322

Access URL: https://doaj.org/article/4a1c4b8b766c45d4be5719b2166ab9f4

Estimation of resist sensitivity for extreme ultraviolet lithography using an electron beam

Authors: Tomoko Gowa Oyama, Akihiro Oshima, Seiichi Tagawa

Source: AIP Advances, Vol 6, Iss 8, Pp 085210-085210-7 (2016)

Subject Terms: Physics, QC1-999

File Description: electronic resource

Relation: https://doaj.org/toc/2158-3226

Access URL: https://doaj.org/article/961d3f1561d14cfa9fae3728d7279a07

Evaluation of resist sensitivity in extreme ultraviolet/soft x-ray region for next-generation lithography

Authors: Tomoko Gowa Oyama, Akihiro Oshima, Masakazu Washio, Seiichi Tagawa

Source: AIP Advances, Vol 1, Iss 4, Pp 042153-042153-5 (2011)

Subject Terms: Physics, QC1-999

File Description: electronic resource

Relation: https://doaj.org/toc/2158-3226

Access URL: https://doaj.org/article/bb7d5e2ebe874c1ea5ce587857b0fc31

Sensitivity enhancement of chemically amplified resists and performance study using extreme ultraviolet interference lithography.

Authors: Buitrago, Elizabeth, Seiji Nagahara, Yildirim, Oktay, Hisashi Nakagawa, Seiichi Tagawa, Meeuwissen, Marieke, Tomoki Nagai, Takehiko Naruoka, Verspaget, Coen, Hoefnagels, Rik, Rispens, Gijsbert, Shiraishi, Gosuke, Yuichi Terashita, Yukie Minekawa, Kosuke Yoshihara, Akihiro Oshima, Vockenhuber, Michaela, Ekinci, Yasin

Source: Journal of Micro/Nanolithography, MEMS & MOEMS; Jul2016, Vol. 15 Issue 3, p033502-1-033502-9, 9p

Subject Terms: PHOTORESISTS, EXTREME ultraviolet lithography, SEMICONDUCTOR industry, PHOTOSENSITIVITY, ULTRAVIOLET radiation

Ecofriendly ethanol-developable processes for electron beam lithography using positive-tone dextrin resist material.

Authors: Satoshi Takei, Naoto Sugino, Makoto Hanabata, Akihiro Oshima, Miki Kashiwakura, Takahiro Kozawa, Seiichi Tagawa

Source: Applied Physics Express; Jul2017, Vol. 10 Issue 7, p1-1, 1p

Hall resistivity and transverse magnetoresistivity generated in simultaneous presence of spin-polarized current and external magnetic field in a nonmagnetic bipolar conductor YH2.

Authors: Masamichi Sakai, Hiraku Takao, Tomoyoshi Matsunaga, Yusuke Tanaka, Tatsuya Arai, Shota Haruyama, Takashi Otomo, Hiroaki Hirama, Takahito Sakuraba, Zentaro Honda, Koji Higuchi, Akira Kitajima, Akihiro Oshima, Shigehiko Hasegawa, Hiroyuki Awano

Source: Japanese Journal of Applied Physics; Jan2015, Vol. 54 Issue 1, p1-1, 1p

Application of natural linear polysaccharide to green resist polymers for electron beam and extreme-ultraviolet lithography.

Authors: Satoshi Takei, Akihiro Oshima, Tomoko G. Oyama, Kenta Ito, Kigen Sugahara, Miki Kashiwakura, Takahiro Kozawa, Seiichi Tagawa, Makoto Hanabata

Source: Japanese Journal of Applied Physics; Nov2014, Vol. 53 Issue 11, p1-1, 1p

Temperature effects on radiation induced phenomena in polymers

Authors: Yoneho, Tabata, Akihiro, Oshima, Kazunobu, Takashika, Tadao, Seguchi

Source: In Radiation Physics and Chemistry 1996 48(5):563-568

Surface modification of polytetrafluoroethylene by synchrotron radiation.

Authors: Yasunori Sato¹ yasunori_211@ruri.waseda.jp, Daichi Yamaguchi¹, Takanori Katoh², Shigetoshi Ikeda³, Yasushi Aoki², Akihiro Oshima¹, Yoneho Tabata⁴, Masakazu Washio¹

Source: Nuclear Instruments & Methods in Physics Research Section B. Aug2003, Vol. 208 Issue 1-4, p231-235. 5p.

Subject Terms: *POLYTEF, *SPECTRAL irradiance, *SYNCHROTRON radiation